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In Situ Fabricated Microchannels Using Porous Polymer and Xenon Difluoride Etchant
G.L. Subrebost, A.J. Rosenbloom, V. Weedn, and K. Gabriel
Proceedings of the Sixth International Symposium on Micro Total Analysis System (mTAS 2002), Nara, Japan, Nov. 2-8, 2002., November, 2002.

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Abstract

A novel microfluidic fabrication technique which allows in situ formed silicon microchannels and does not necessitate substrate bonding is presented. A gas-permeable polymer membrane acts as the top surface of the microchannel, allowing xenon difluoride (XeF2) etchant to pass unobstructed to the silicon substrate. Exposed silicon areas on the wafer are then etched isotropically.

Notes

Associated lab/group: Microelectromechanical Systems Laboratory

Text Reference

G.L. Subrebost, A.J. Rosenbloom, V. Weedn, and K. Gabriel, "In Situ Fabricated Microchannels Using Porous Polymer and Xenon Difluoride Etchant," Proceedings of the Sixth International Symposium on Micro Total Analysis System (mTAS 2002), Nara, Japan, Nov. 2-8, 2002., November, 2002.

BibTeX Reference

@inproceedings{Subrebost_2002_4142,
   author = "George Lopez Subrebost and Alan J. Rosenbloom and Victor Weedn and Kaigham Gabriel",
   title = "In Situ Fabricated Microchannels Using Porous Polymer and Xenon Difluoride Etchant",
   booktitle = "Proceedings of the Sixth International Symposium on Micro Total Analysis System (mTAS 2002), Nara, Japan, Nov. 2-8, 2002.",
   month = "November",
   year = "2002"
}